OPTICAL METROLOGY PRODUCT THAT PROVIDES

Brand	Owner	Address	Description
LUMENA	LITEL INSTRUMENTS	6142 Nancy Ridge Drive; Ste. 102 San Diego CA 92121	optical metrology product that provides an accurate measurement of the Numerical Aperture of a lithography tool and variation of same across the stepper or scanner exposure field, by utilizing an instrument that fits in a standard reticle/pellicle envelope, and a software package that processes the wafer images;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.