NITTA DuPont Incorporated

ADVANCED SURFACE CREATION

In the statement, line 1, NITTA HAAS INCORPORATED is deleted, and NITTA DUPONT INCORPORATED is inserted.;Work holding instruments for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank components for semiconductor wafer surface polishing machines and apparatus; mounting films for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting films for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting films for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting films for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting films for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus;Polishing pads; abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing cloth; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations;Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals;ADVANCED SURFACE;

EXTERION

[ Polishing machines for glass; ] polishing machines for glass substrates, and parts therefor, namely, polishing pads for polishing machines for glass substrates; semiconductor wafer processing equipment, namely, polishing pads for semiconductor wafers; semiconductor wafer processing equipment, namely, [ polishing machines for semiconductor wafer surfaces, ] parts for polishing machines for semiconductor wafer surfaces [ semiconductor manufacturing machines ];Abrasive paper, namely, sand paper; abrasive cloth [; abrasive sand; polishing preparations; semiconductor polishing slurries; polishing slurries ];[ Chemicals for use in industry and science ];

FLEXMOUNT

In the Statement, Page 2, lines 18-22 and lines 25-27, at each occurrence and before HARD DISKS, MANUFACTURING should be inserted, and, In the Statement, Page 2, lines 28-33, at each occurrence, after FOR, ELECTRIC should be inserted, and, In the Statement, Page 2, line 34, before POLISHING MACHINES, ELECTRIC should be inserted, and, In the Statement, Page 2, line 34, before POLISHING APPARATUS, ELECTRIC should be inserted, and, In the Statement, Page 2, line 34 after FOR, ELECTRIC should be inserted.;Holding devices for machines for semiconductor wafer surface polishing machines; holding devices for machines for semiconductor wafer surface polishing apparatus; machine templates for semiconductor wafer surface polishing machines; machine templates for semiconductor wafer surface polishing apparatus; blank machine templates for semiconductor wafer surface polishing machines; blank machine templates for semiconductor wafer surface polishing apparatus; mounting pads and sheets for semiconductor wafer surface polishing machines; mounting pads and sheets for semiconductor wafer surface polishing apparatus; polishing pads for semiconductor wafer surface polishing machines; polishing pads for semiconductor wafer surface polishing apparatus; semiconductor wafer surface polishing machines; semiconductor wafer surface polishing apparatus; semiconductor manufacturing machines; semiconductor manufacturing apparatus; holding devices for machines for glass polishing machines; holding devices for machines for glass polishing apparatus; templates for glass polishing machines; templates for glass polishing apparatus; blank templates for glass polishing machines; blank templates for glass polishing apparatus; mounting pads and sheets for glass polishing machines; mounting pads and sheets for glass polishing apparatus; polishing pads for glass polishing machines; polishing pads for glass polishing apparatus; glass polishing machines; glass polishing apparatus; holding devices for machines for glass substrate polishing machines; holding devices for machines for glass substrate polishing apparatus; templates for glass substrate polishing machines; templates for glass substrate polishing apparatus; blank templates for glass substrate polishing machines; blank templates for glass substrate polishing apparatus; mounting pads and sheets for glass substrate polishing machines; mounting pads and sheets for glass substrate polishing apparatus; polishing pads for glass substrate polishing machines; polishing pads for glass substrate polishing apparatus; glass substrate polishing machines; glass substrate polishing apparatus; holding devices for machines for glass disk polishing machines; holding devices for machines for glass disk polishing apparatus; templates for glass disk polishing machines; templates for glass disk polishing apparatus; blank templates for glass disk polishing machines; blank templates for glass disk polishing apparatus; mounting pads and sheets for glass disk polishing machines; mounting pads and sheets for glass disk polishing apparatus; polishing pads for glass disk polishing machines; polishing pads for glass disk polishing apparatus; glass disk polishing machines; glass disk polishing apparatus; holding devices for metal polishing machines for * manufacturing *hard disks; holding devices for metal polishing apparatus for * manufacturing * hard disks; templates for metal polishing machines for * manufacturing * hard disks; templates for metal polishing apparatus for * manufacturing * hard disks; blank templates for metal polishing machines for * manufacturing * hard disks; blank templates for metal polishing apparatus for hard disks; mounting pads and sheets for metal polishing machines for hard disks; mounting pads and sheets for metal polishing apparatus for * manufacturing * hard disks; polishing pads for metal polishing machines for * manufacturing * hard disks; polishing pads for metal polishing apparatus for * manufacturing * hard disks; metal polishing machines for * manufacturing * hard disks; metal polishing apparatus for * manufacturing * hard disks; holding devices for * electric * polishing machines; holding devices for * electric * polishing apparatus; templates for * electric * polishing machines; templates for * electric * polishing apparatus; blank templates for * electric * polishing machines; blank templates for * electric * polishing apparatus; mounting pads and sheets for * electric *polishing machines; mounting pads and sheets for * electric * polishing apparatus; polishing pads for * electric * polishing machines; polishing pads for * electric * polishing apparatus; * electric * polishing machines; * electric * polishing apparatus; polishing cloth for * electric * polishing machines;Abrasive paper, namely, sand paper; abrasive cloth; abrasive sand; polishing paper; polishing, scouring and abrasive preparations;FLEX MOUNT;Chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates;

MACHPLANER

[ Polishing machines for glass; polishing machines for glass substrates, and parts therefor, namely, polishing pads for polishing machines for glass substrates; semiconductor wafer processing equipment, namely, polishing pads for semiconductor wafers; semiconductor wafer processing equipment namely, polishing machines for semiconductor wafer surfaces, and parts therefor; semiconductor manufacturing machines ];MACH PLANER; MACHINE PLANER;[ Abrasive paper, namely, sand paper; abrasive cloth; ] abrasive sand; [ cleaning and polishing paper; ] polishing preparations; semiconductor polishing slurries; polishing slurries;Chemicals for use in industry and science;

NANOPURE

NANO PURE;Semiconductor polishing slurries, polishing slurries; polishing preparations [ ; abrasive paper, namely,sand paper; abrasive cloth; abrasive sand; polishing paper; polishing cloth ];Chemicals for use in industry and science;