MACHINE TECHNOLOGY, INC.

"SUPER SCRUBBER"

Machines for Cleaning Semiconductor Wafers and Masks;

AFTERGLO

RESIST STRIPPING MACHINES FOR SEMICONDUCTOR WAFERS;AFTER GLOW;

FLEXIFAB

EQUIPMENT FOR PROCESSING SEMI-CONDUCTOR WAFERS HAVING A PLURALITY OF ASPECTS INCLUDING TRANSPORTING, SCRUBBING, PRIMING, CHILLING, PHOTORESIST COATING, DEVELOPING AND BAKING;

LOCK 'N' DOCK

SELF-CONTAINED UNIT FOR PROVIDING POWER CONNECTIONS, FLUIDIC CONNECTIONS, VACUUM CONNECTIONS, AND EXHAUST AND AIR CONNECTIONS TO SEMI-CONDUCTOR WAFER FABRICATION MACHINE;LOCK AND DOCK;

MACHINE TECHNOLOGY, INC.

LABORATORY EQUIPMENT-NAMELY, COLD PLATE COOLING UNITS;MACHINES FOR CLEANING SEMICONDUCTOR WAFERS AND MASKS, MACHINES FOR COATING AND/OR DEVELOPING SEMICONDUCTOR WAFERS AND/OR MASKS, AND MACHINES FOR PULLING BOATS THROUGH SEMICONDUCTOR DIFFUSION TUBES;APPLICANT DISCLAIMS THE TERMS MACHINE AND INC. APART FROM THE MARK AS SHOWN WITHOUT WAIVING ANY COMMON LAW RIGHTS THEREIN.;

MTI

LABORATORY EQUIPMENT-NAMELY, COLD PLATE COOLING UNITS;MACHINES FOR CLEANING SEMICONDUCTOR WAFERS AND MASKS, MACHINES FOR COATING AND/OR DEVELOPING SEMICONDUCTOR WAFERS AND/OR MASKS, AND MACHINES FOR PULLING BOATS THROUGH SEMICONDUCTOR DIFFUSION TUBES;

MTI

Laboratory Equipment-Namely, Cold Plate Cooling Units;MACHINES FOR CLEANING SEMICONDUCTOR WAFERS AND MASKS, MACHINES FOR COATING AND/OR DEVELOPING SEMICONDUCTOR WAFERS AND/OR MASKS, (( AND MACHINES FOR PULLING BOATS THROUGH SEMICONDUCTOR DIFFUSION TUBES ));

MULTIFAB

Equipment for Processing Semiconductors-Namely, Wafer Scrubbers and Cleaners, Wafer Photoresist Coaters, Wafer Photoresist Developers and Wafer Bakers;

OMNICHUCK

Multi-Process Apparatus for Processing Semiconductor Wafers and Masks to Implement Any of the Steps of Scrubbing, Coating and Development Using Either Positive or Negative Photoprocessing and Employing a Microwave Bake;

SYPHERLINE

AUTOMATED SPUTTERING APPARATUS FOR PROCESSING SEMICONDUCTOR WAFERS;

TARGETRACK

SEMICONDUCTOR WAFER PROCESSING MACHINE;TARGET TRACK;

UNILOAD

Stand Alone Negative and/or Positive Developer Machines for Use in Processing Semiconductor Wafers and Masks; and Multiple Process Scrubber, Photoresist and Doping Agent Coater, Spin Coater, Negative and/or Positive Developer, Vacuum Bake and/or Processor Apparatus, Sold as a Unit, for Processing Semiconductor Wafers and Masks;Stand Alone Scrubbers for Cleaning; Photoresist and Doping Agent Coaters; and Spin Coaters for Use in Processing Semiconductor Wafers and Masks;Stand Alone Microwave Vacuum Baking Units for Use in Processing Semiconductor Wafers and Masks;

VACUPRYME

COATING MACHINES FOR APPLYING A PRIME COATING TO SEMI-CONDUCTOR WAFERS;VACUPRIME;

VAPORJET

MEASURED FLUID DISPENSING UNIT EMPLOYED IN SEMI-CONDUCTOR WAFER PROCESSING EQUIPMENT;VAPOR JET;

WAFERBOT

Robotic Interface for Processing Semiconductors;

WE KEEP IT SIMPLE

Multi-Process Apparatus for Processing Semiconductor Wafers and Masks to Implement Any of the Steps of Scrubbing, Coating and Developing Using Either Positive or Negative Photoprocessing and Employing a Microwave Bake;