SYSTEMS LINE

Brand Owner Address Description
S-LINE Integrated Illumination Systems Inc. 355 Bantam Lake Rd. Morris CT 067631102 SYSTEMS-LINE;Lighting fixtures;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate improved critical dimension (CD) control and the reduction of line-edge roughness (LER) during pattern line formation in an imprint mask. One aspect of the invention provides for forming features having CDs that are larger than ultimately desired in a mask resist. Upon application of a non-lithographic shrink technique, LER is mitigated and CD is reduced to within a desired target tolerance.