SCANNING ELECTRON MICROSCOPES SEM

Brand Owner (click to sort) Address Description
EITRE Obducat AB P.O. Box 580 Malmö SE201 25 Sweden [ Scanning Electron Microscopes (SEM); ] computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;The wording EITRE appearing in the mark has no meaning in a foreign language.;
IPS Obducat AB P.O. Box 580 Malmö SE201 25 Sweden [ Scanning Electron Microscopes (SEM); ] computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR);Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;
OBDUCAT Obducat AB P.O. Box 580 Malmö SE201 25 Sweden Scanning Electron Microscopes (SEM); computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;Color is not claimed as a feature of the mark.;OBDUCAT appearing in the mark has no meaning in a foreign language.;
SINDRE Obducat AB P.O. Box 580 Malmö SE201 25 Sweden [ Scanning Electron Microscopes (SEM); ] computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;Color is not claimed as a feature of the mark.;The wording SINDRE appearing in the mark has no meaning in a foreign language.;
SOFTPRESS Obducat AB P.O. Box 580 Malmö SE201 25 Sweden [ Scanning Electron Microscopes (SEM); computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) ];Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;SOFT PRESS;Color is not claimed as a feature of the mark.;
STU Obducat AB P.O. Box 580 Malmö SE201 25 Sweden [ Scanning Electron Microscopes (SEM); ] computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR);Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A scanning transmission electron microscope which enhances correction accuracy of a de-scanning coil for canceling a transmitted-electron-beam position change on an electron detector. Here, this transmitted-electron-beam position change appears in accompaniment with a primary-electron-beam position change on a specimen caused by a scanning coil. First, control over the scanning coil is digitized. Moreover, while being synchronized with a digital control signal resulting from this digitization, values in a de-scanning table registered in a FM(2) are outputted to the de-scanning coil. Here, the de-scanning table is created as follows: Diffraction images before and after activating the scanning coil and the de-scanning coil are photographed using a camera. Then, based on a result acquired by analyzing a resultant displacement quantity of the diffraction images by the image processing, the de-scanning table is created.