PURIFIED PHOTORESIST COMPOSITION USED IN

Brand	Owner	Address	Description
PKP	TRANSENE COMPANY, INCORPORATED	ROUTE ONE, TURNPIKE ROWLEY MA 01969	PURIFIED PHOTORESIST COMPOSITION USED IN PHOTO LITHOGRAPHY;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The first photoresist X absorbs at a higher wavelength than the second photoresist Y. The second photoresist Y has a lower glass transitional temperature than the first photoresist X.