POWER CLEAN

Brand Owner (click to sort) Address Description
POW'RKLEEN WOODBINE PRODUCTS COMPANY 915 W. SMITH RD. MEDINA OH 44256 POWER CLEAN;Hand Cleaner and Creme;
POWER KLEEN K & N ENGINEERING, INC. 1455 Citrus Street Riverside CA 92507 POWER CLEAN;Multi-purpose cleaner and degreasing preparations for air and oil filters and automotive parts;CLEAN;
POWER-KLEEN K.O. MANUFACTURING, INC. 2720 East Division Springfield MO 65803 POWER CLEAN;CONCENTRATED CAR WASH DETERGENT FOR USE IN COMMERCIAL CAR WASH FACILITIES;
POWERCLEAN QIAGEN SCIENCES 19300 Germantown Road Germantown MD 20874 POWER CLEAN;reagent kits comprising [ generic DNA circle, DNA primers, polymerase and ] buffers for use in biotechnology fields;
POWERCLEAN ARCH CHEMICALS, INC. 90 Boroline Road Allendale NJ 07401 POWER CLEAN;Chemicals used to sanitize and to treat water, swimming pools, spas and hot tubs;
POWERCLEAN KONINKLIJKE PHILIPS ELECTRONICS N.V. High Tech Campus 5 Eindhoven 5656 AE Netherlands POWER CLEAN;Electric and Battery Operated Toothbrushes;
POWERCLEAN Impact Fluid Solutions, LP Suite 2000 2800 Post Oak Blvd. Houston TX 77056 POWER CLEAN;chemical additives for oil well drilling fluids;
POWERCLEAN GLOBE UNION INDUSTRIAL CORP. Taichung Export Processing Zone 22, Chien-Kuo Road Taichung Taiwan POWER CLEAN;Toilets;
POWERCLEAN CUSTOM MOLDED PRODUCTS 36 Herring Road Newnan GA 30265 POWER CLEAN;Swimming pool chlorinating apparatus;
POWERCLEAN Cleaning Equipment Trade Association-CETA 409 S Central Expy, Suite 107-205 Anna TX 754094910 POWER CLEAN;Conducting trade shows in the field of the pressure washing industry;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A process for reducing the formation of potential device-contaminating particles in a process chamber, particularly an etch chamber or a pre-clean chamber used to pre-clean substrates prior to a PVD or other process. The process chamber conventionally includes multiple antennae, the purpose of which is to conduct bias power from a bias power source to a substrate supported on a pedestal assembly. According to the process of the invention, the antennae are removed from the pedestal assembly. Accordingly, the antennae, no longer present in the chamber during substrate processing, are capable of neither generating potential device-contaminating particles nor causing electrical arcing between the pedestal assembly and the chamber wall or other elements in the process chamber, leading to operational power loss.