POLYMERIC MATERIALS IN FORM

Brand Owner (click to sort) Address Description
CHO-LECTOR CHOMERICS, INC. Woburn MA Polymeric Materials in the Form of Beads, Sheets, and Shaped Sections for Use in Manufacture;COLLECTOR;
CHO-ORDINATOR CHOMERICS, INC. Woburn MA Polymeric Materials in the Form of Beads, Sheets, and Shaped Sections for Use in Manufacture;COORDINATOR;
CHO-POLYMER CHOMERICS, INC. Woburn MA Polymeric Materials in the Form of Beads, Sheets, and Shaped Sections for Use in Manufacture;COPOLYMER;
CHO-RECTOR CHOMERICS, INC. Woburn MA Polymeric Materials in the Form of Beads, Sheets, and Shaped Sections for Use in Manufacture;CORRECTOR;
RETIFLEX RETIFLEX S.P.A. 31 FORO BUONAPARTE MILAN Italy POLYMERIC MATERIALS IN THE FORM OF FILMS, NETS, FIBERS AND ROPES TO BE USED AS REINFORCEMENT AND/OR CONSOLIDATION OF SOILS AND BUILDINGS;POLYMERIC MATERIALS IN THE FORM OF FILMS, NETS, FIBERS AND ROPES TO BE USED AS REINFORCEMENT AND/OR FRAMEWORK FOR HYDRAULIC BINDER (CEMENT, BETON, GYPSUM, ETC.), OF BITUMEN AND ASPHALT, RESINS, PLYWOOD AND PAPER;RETI-FLEX;
TEXIPOL SCOTT BADER COMPANY LIMITED Wollaston Wellingborough Northamptonshire NN297RL United Kingdom POLYMERIC MATERIALS IN THE FORM OF [ SOLIDS, LIQUIDS ] EMULSIONS [ OR GELS, ALL ] BEING CHEMICAL SUBSTANCES, AND FOR USE IN THE MANUFACTURING OF [ PAPER, TRANSPARENT FILMS, ] TEXTILES, ADHESIVE, PAINTS AND THE LIKE SURFACE COATINGS, THICKENING AGENTS, FLOCCULANTS AND OF DISPERSANTS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Method and structure for optimizing dual damascene patterning with polymeric dielectric materials are disclosed. Certain embodiments of the invention comprise polymeric sacrificial light absorbing materials ("polymer SLAM") functionalized to have a controllable solubility switch wherein such polymeric materials have substantially the same etch rate as conventionally utilized polymeric dielectric materials, and subsequent to chemical modification of solubility-modifying protecting groups comprising the SLAM materials by thermal treatment or in-situ generation of an acid, such SLAM materials become soluble in weak bases, such as those conventionally utilized to remove materials in lithography treatments.