POLYAMIC ACID SOLUTION

Brand Owner (click to sort) Address Description
PHOTONEECE TORAY KABUSHIKI KAISHA 1-1, 2-chome Nihonbashi-Muromachi Chuo-ku Tokyo Japan Polyamic Acid Solution, Used as an Insulating Layer and a Protective Layer in Electronics for Such Devices as Transistors, Diodes, Intergrated Circuits and Large Scale Intergrated Circuits;
SEMICOFINE TORAY KABUSHIKI KAISHA 1-1, 2-chome Nihonbashi-Muromachi Chuo-ku Tokyo Japan Polyamic Acid Solution, Used as an Insulating Layer and a Protective Layer in Electronics for Such Devices as Translators, Diodes, Intergrated Circuits and Large Scale Intergrated Circuits;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Disclosed is a method for forming an alignment layer of an LCD capable of preventing Mura defects when the alignment layer is formed through an LC one drop fill process. The method includes the steps of coating a mixing solution including a solvent and organic polymer materials consisting of polyimide and polyamic acid on the substrates, pre-curing the mixing solution twice with mutually different temperatures, thereby volatizing the solvent and obtaining stable phase-separation between the organic polymer materials and the solvent, and completely curing the pre-cured mixing solution at a temperature of about 180 to 240° C. A primary pre-curing process is performed at a temperature less than 50° C. under vacuum pressure of about ?35 to ?50 psi, and a secondary pre-curing process is performed at a temperature within a range of about 50 to 75° C. under the same vacuum pressure.