POLISHING PADS INDUSTRIAL POLISHING

Brand	Owner	Address	Description
MIRAFLEX	Kabushiki Kaisha Fujimi Incorporated	1-1, Chiryo 2-chome, Nishibiwajima-cho Kiyosu-shi, Aichi 452-8502 Japan	Polishing pads for industrial polishing machines for use in polishing semiconductors, electronic circuits, hard discs, ceramics, sapphires, crystals, glasses, plastics, computer chips, metallic oxides and metallic materials during the manufacturing process;MIRA FLEX;Fixed abrasive grain, namely, abrasive rolls, abrasive sheets, abrasive strips, and abrasive disks;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

Double-sided polishing equipment configured to polish a rectangular substrate, comprising a carrier having a pocket configured to accommodate a rectangular substrate, a lateral linear moving mechanism configured to move the carrier, first and second polishing pads with first and second rotational axes, respectively, offset from centers of the pads, the polishing surfaces of the first and second polishing pads being parallel. The equipment further includes at least one elevating mechanism coupled to at least one of the polishing pads, first and second rotary drive mechanisms coupled to each of the first and second polishing pads, respectively; and configured to rotate the first and second pads about the first and second rotational axes. A polishing-agent supplying device is present and configured to supply polishing agent to a plane where a substrate that is accommodated in the pocket to accommodate the substrate comes into contact with the polishing pads.