PHOTORESIST ADHESION PROMOTER USED ON

Brand	Owner	Address	Description
RESIST-AID	TRANSENE COMPANY, INCORPORATED	ROUTE ONE, TURNPIKE ROWLEY MA 01969	PHOTORESIST ADHESION PROMOTER USED ON SILICON AND OTHER SEMICONDUCTOR SUBSTRATE MATERIALS TO IMPROVE THE ADHESION OF PHOTORESIST FILMS IN THE TECHNOLOGY FOR THE MANUFACTURE OF TRANSISTORS, INTEGRATED CIRCUITS AND OTHER SEMICONDUCTOR DEVICES, PURCHASED BY ELECTRONICS COMPANIES WHICH MANUFACTURE TRANSISTORS, INTEGRATED CIRCUITS AND RELATED DEVICES;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.