PHOTOMASKS OPTICAL TRANSFER

Brand	Owner (click to sort)	Address	Description
ROCKWOOD SPECIALTIES	Rockwood Specialties, Inc.	22 CHAMBERS ST., SUITE 201 PRINCETON NJ 08542	PHOTOMASKS FOR THE OPTICAL TRANSFER OF IMAGES TO THE SURFACE OF SILICON WAFERS DURING THE MANUFACTURE OF SEMICONDUCTORS;SPECIALITIES;
ROCKWOOD SPECIALTIES	Laporte Inc.	22 Chambers Street Suite 201 Princeton NJ 08542	PHOTOMASKS FOR THE OPTICAL TRANSFER OF IMAGES TO THE SURFACE OF SILICON WAFERS DURING THE MANUFACTURE OF SEMICONDUCTORS;SPECIALITIES;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

The invention relates to a resist for electron beam lithography and to a process for producing photomasks for optical lithography. The inventive resist includes repeating units that are derived from maleic anhydride and that can act as an anchor group for the subsequent binding of silicon-containing groups. The etch stability of the resist can thus be subsequently increased so that there is no dimensional loss on transfer of the resist structure to a chromium layer arranged under the resist.