PERFORMING METAL DEPOSITION PROCESSES COMBINING

Brand	Owner	Address	Description
DM3M	DM3D Technology	2350 Pontiac Road Auburn Hills MI 48326	Performing metal deposition processes combining two or more dissimilar materials with distinct properties into a single component for enhancing product performance;DM THREE M;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

Chemical phase deposition processes utilizing organometallic precursors to form thin films are herein described. The organometallic precursors may include a single metal center or multiple metal centers. The chemical phase deposition may be chemical vapor deposition (CVD), atomic layer deposition (ALD), or hybrid CVD and ALD. The use of these chemical phase deposition processes with the organometallic precursors allows for the conformal deposition of films within openings having widths of less than 100 nm and more particularly less than 50 nm to form thin films such as barrier layers, seed layers, and adhesion layers.