MECHANICAL CLEANING BOOTHS FOR

Brand Owner Address Description
DETREX DETREX CORPORATION 24901 Northwestern Hwy, Suite 410 Southfield MI 48075 [ MECHANICAL CLEANING BOOTHS FOR SPRAY CLEANING OF SMALL METAL PARTS AND THE LIKE WITH ORGANIC SOLVENTS, ALKALINE EMULSIONS, AND THE LIKE; DEGREASING MACHINES,] SOLVENT DISTILLING AND RECOVERY UNITS FOR ORGANIC CLEANING AND DEGREASING SOLVENTS, [ EXTRACTOR MACHINES FOR REMOVING OIL AND THE LIKE FROM SOY BEANS OR SIMILAR NATURAL PRODUCTS, ] [ SOLVENT STILLS,] [ SHEAVES, PUMPS FOR HANDLING LIQUIDS, ] [ EMULSION WASHERS, SPRAY MACHINES, METAL CLEANING MACHINES KNOWN AS CONTINUOUS SPRAY INSTALLATIONS FOR CLEANING AND RUSTPROOFING HARDWARE, MACHINED PARTS AND MANUFACTURED ARTICLES, PAINT STRIPPING MACHINES, CONVEYOR APPARATUS FOR CONTINUOUSLY MOVING METAL PARTS AND SOLID COMPOSITIONS IN INDUSTRIAL PROCESSING OPERATIONS, HOISTS FOR LIFTING HEAVY OBJECTS, ] SEPARATORS FOR SEPARATING WATER FROM CONDENSED SOLVENTS IN DRY [ CLEANING AND METAL CLEANING OPERATIONS, ] [ METAL AND THE LIKE, PULLEYS, ] [ ALKALI WASHING MACHINES FOR WASHING METALS, PLASTICS, GLASS AND THE LIKE, MINERAL SPIRIT AND PETROLEUM ] SPIRIT WASHING MACHINES FOR WASHING METALS, PLASTICS, GLASS AND THE LIKE, [ METAL CLEANING MACHINES USING SOLVENT CLEANERS, MECHANIZED DIP TANKS FOR DIPPING MACHINES, ENGINES AND METAL PARTS INTO RUSTPROOFING, CHEMICAL CLEANING, DEGREASING AND OTHER LIKE BATHS,] [ AND BOILER FEED AND CONDENSATE RETURN PUMPS, PIPING, COILS, VALVES AND THE LIKE IN THE FORM OF A COMPLETE UNIT FOR MOVING BOILER FEED FLUIDS AND CONDENSED BOILER FLUIDS ];
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. An antimicrobial cleaning composition and methods for cleaning semiconductor substrates, particularly after chemical mechanical planarization or polishing, are provided. In one embodiment, the cleaning composition combines a solvent, a cleaning agent such as a hydroxycarboxylic acid or salt thereof, and at least one antimicrobial agent resulting in a cleaning composition in which microbial growth is inhibited. Examples of suitable antimicrobial agents include a benzoic acid or salt such as potassium or ammonium benzoate, and sorbic acid or salt such as potassium sorbate. The composition is useful for cleaning a wafer and particularly for removing residual particles after a conductive layer has been planarized to a dielectric layer under the conductive layer in a chemical mechanical planarization of a semiconductor wafer with abrasive slurry particles, particularly after a CMP of copper or aluminum films. Use of the cleaning composition advantageously inhibits microbial growth in the cleaning solution and deposition on the cleaned planarized surface.