MACHINES PHYSICS CHEMISTRY

Brand Owner Address Description
KEIHIN CORPORATION KEIHIN CORPORATION 26-2, Nishishinjuku 1-chome Shinjuku-ku, Tokyo Japan Machines for physics and chemistry laboratory use, namely, scales; measuring machines, namely, precision dimension-measuring machines, automatic humidity-regulating machines, and material-content testing machines; switches, relays, circuit breakers, controllers, rectifiers, distributors, fuses, and transformers; distributing and controlling machines, namely, induction voltage regulators; batteries, namely, storage batteries and optical batteries; telecommunication machines, namely, telephones, wire communication machines in the nature of telegraphs, wireless communication machines in the nature of cellular telephones; remote earth-measurement-control machines, namely seismographs; electronic-application machines and components thereof, namely, high-frequency sewing machines, industrial X-ray machines, magnetic detectors, magnetic disc shielding cases, electronic microscopes, word processors, electron tubes, computers, computer components in the nature of a computer mouse, electronic circuits, semiconductors, computer peripheral devices in the nature of blank magnetic discs and blank magnetic tapes; electric magnetic measuring apparatuses, namely, phase meters, oscillographs, circuit testers, detection meters, frequency meters, resistance-measuring apparatuses, voltmeters, ampere meters, watt meters, oscillators, and capacity meters;The word KEIHIN means an area in and around Tokyo and Yokohama in Japan.;CORPORATION;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A plasma processing system for and method of utilizing an improved etch chemistry for effectively etching high aspect ratio silicon features. The process chemistry employs precursor gases suitable for producing a fluorine/chlorine etch chemistry as well as precursor gases suitable for forming chemical bonds of sufficient strength to create stable feature side-walls. The improved process chemistries include SO2/SF4/SiCl4, SO2/SF4/Cl2, SO2/SiF4/SiCl4, SO2SIF4/Cl2, O2/F2/Cl2, N2 O/F2/Cl2, and NO2/F2/Cl2-based chemistries.