HARD MAN

Brand Owner (click to sort) Address Description
HARDMAN KARELITZ INTERNATIONAL, INC. UNIT NO. 3414 ONE DEVONSHIRE PLACE BOSTON MA 02109 HARD MAN;fashion clothing; namely, sportswear; namely, jackets, T-shirts, hats and pants, shorts, running suits, athletic shoes, casual footwear, bathing suits, sweaters, vests, rainwear, skiwear, outerwear; namely, coats, jackets, raincoats and vests, underwear, pajamas, robes, socks, headbands, wristbands, neckties, scarves and gloves;
HARDMAN ROYAL ADHESIVES AND SEALANTS WLB - Law - Trademarks 2001 West Washington Street South Bend IN 46628 HARD MAN;[ hand cleanser for use without water ];chemicals, namely, adhesives and elastomers for general repair, bonding and sealing purposes in industrial, commercial and residential uses, namely, composite epoxy resins and hardeners for use as potting, casting and encapsulant materials; [ UV and/or electron beam cured epoxy resins for use as encapsulants, adhesives and coating materials; ] polyurethane, synthetic resins [ and UV and/or electron beam cured adhesives ] for use as encapsulants and for general repair, bonding, sealing and coating purposes in industrial, commercial and residential uses [ ; and solvents to remove adhesives from machines, parts and work areas ];
HARDMAN ELEMENTIS PERFORMANCE POLYMERS, A DIVISION OF HARCROS CHEMICALS INC. 600 Cortlandt Street Belleville NJ 071093384 HARD MAN;[ hand cleanser for use without water ];chemicals, namely, adhesives and elastomers for general repair, bonding and sealing purposes in industrial, commercial and residential uses, namely, composite epoxy resins and hardeners for use as potting, casting and encapsulant materials; [ UV and/or electron beam cured epoxy resins for use as encapsulants, adhesives and coating materials; ] polyurethane, synthetic resins [ and UV and/or electron beam cured adhesives ] for use as encapsulants and for general repair, bonding, sealing and coating purposes in industrial, commercial and residential uses [ ; and solvents to remove adhesives from machines, parts and work areas ];
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A thin hard mask is formed over a semiconductor substrate. The thin hard mask allows diffusion of a sacrificial material or pore-forming agent therethrough to form an underlying air gap or porous dielectric region. The thin hard mask may be a polymer or an initially porous material that may be later densified. The thin hard mask may be used to prevent etch steps used in forming an unlanded via from reaching layers below the hard mask.