ELECTRA FILM

Brand	Owner	Address	Description
ELECTRAFILM	New Energy Technologies, Inc.	430 Park Avenue Suite 702 New York NY 10022	ELECTRA FILM;Electricity generating coatings applied to various substrate surfaces for use in renewable energy;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A four-layer structured hard mask composed of a SiC film, a first SiO2 film, a SiC film, and a second SiO2 film is formed on a porous silica film as an interlayer insulating film. Then, the second SiO2 film is etched with a resist mask. Subsequently, the SiC film is etched with the second SiO2 film. Thereafter, the first SiO2 film is etched with the SiC film. Subsequently, the SiC film is etched with the SiC film. Then, by etching the porous silica film with the SiC film, a wiring trench is formed. At this time, a selection ratio between the SiC film and the porous silica film is large, so that deformation of the SiC film rarely occurs, which prevents leakage caused by the deformation.