DOSAGE APPARATUS BULK GOODS

Brand Owner Address Description
EMC MASCHINENFABRIK GUSTAV EIRICH GMBH & CO. KG Walldurner Strasse 50 Hardheim D-74736 Germany Dosage apparatus for bulk goods in solid and liquid form, namely, flow meters and flow regulators, and calibrating feeders for processing free flowing bulk materials, slurries, and sludges in continuous or discontinuous industrial processes in the chemical, ceramic and metallurgic industries as well as for the building materials industry; electric or electronic controls, namely, control hardware, in the nature of computers, programmable logic controllers, and computer software for controlling industrial machinery and pressure, temperature, and flow sensors; replacement parts for the aforementioned goods;Mechanical mixing machines for the chemical, ceramic and metallurgic industries as well as for the building materials industry, in particular mixing machines for the carbon industry and for the aluminum industry; stirring machines and kneading machines for the chemical, ceramic and metallurgic industries as well as for the building materials industry; cut-off machines, pressing machines, granulating machines, reaction machines, emulating machines, disintegration machines, and conditioning machines for processing free flowing bulk materials, slurries, and sludges in continuous or discontinuous industrial processes in the chemical, ceramic and metallurgic industries as well as for the building materials industry; replacement parts for the aforementioned machines; electrically driven and pneumatically driven mechanical conveyors; replacement parts for the aforementioned conveyors;Color is not claimed as a feature of the mark.;Homogenizing machines and autoclaves, namely, heaters, dryers and sterilization machines for the chemical, ceramic and metallurgic industries as well as for the building materials industry and parts of the aforementioned goods used therefore;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.