CLEANING COMPOUNDS FOR USE IN

Brand	Owner (click to sort)	Address	Description
MEANSCO	F. W. MEANS & COMPANY	Chicago IL	CLEANING COMPOUNDS FOR USE IN INDUSTRIAL DRY CLEANING PROCESS;
STEAMFAS	PUREX CORPORATION, LTD.	1001 EAST 62ND STREET LOS ANGELES CA	CLEANING COMPOUNDS FOR USE IN STEAM CLEANING OF MOTOR VEHICLES AND THE LIKE AS A DETERGENT FOR CLEANING ANY SURFACE;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A post-etch residue cleaning composition for cleaning ashed or unashed aluminum/SiN/Si post-etch residue from small dimensions on semiconductor substrates. The cleaning composition contains supercritical CO2 (SCCO2), alcohol, fluoride source, an aluminum ion complexing agent and, optionally, corrosion inhibitor. Such cleaning composition overcomes the intrinsic deficiency of SCCO2 as a cleaning reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that are present in the post-etch residue and that must be removed from the semiconductor substrate for efficient cleaning. The cleaning composition enables damage-free, residue-free cleaning of substrates having ashed or unashed aluminum/SiN/Si post-etch residue thereon.