CLEANING SOLUTIONS USE

Brand Owner (click to sort) Address Description
ACE CLEANING SOLUTIONS 354 BROOKHURST DR. MONROE OH 45050 Cleaning solutions for use in tanker trucks, intermediate bulk containers, intermediate bulk container (IBC) totes, and pallet tanks;
CRT CHEMICAL RESEARCH TECHNOLOGY, INC. W225 N3120 DUPLAINVILLE ROAD PEWAUKEE WI 53072 CLEANING SOLUTIONS FOR USE IN THE PRINTING INDUSTRY;PRINTERS INK;PRINTING CHEMICALS, NAMELY PAPER COATINGS;THE STIPPLING SHOWN ON THE DRAWING OF THE MARK IS A FEATURE OF THE MARK AND DOES NOT INDICATE SHADING OR COLOR.;
ENVIROFLEX FLINT GROUP PACKAGING INKS NORTH AMERICA HOLDINGS 17177 N. Laurel Park Drive, Ste. 300 Livonia MI 48152 Cleaning solutions for use in the printing process;ENVIRO FLEX;
MEGASOLV Austin American Technology Corporation 12201-160 Technology Blvd. Austin TX 787276102 Cleaning solutions for use in cleaning printed circuit boards and electronic components during manufacturing or reworking processes;MEGA SOLVE;
PUNCH LINE Formula Corp. 4432 C Street NE Auburn WA 98002 cleaning solutions for use in the janitorial and supply industries;
TEXPURE Illinois Tool Works Inc. 155 Harlem Avenue Glenview IL 60025 CLEANING SOLUTIONS FOR USE IN CLEANROOMS AND LABORATORIES;TEX PURE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation.