CLEANING SOLUTION CLEAN

Brand Owner (click to sort) Address Description
CLEAN-SHIELD THE GARLAND COMPANY, INC. 3800 East 91st Street Cleveland OH 44105 Cleaning solution to clean, brighten and restore a masonry substrates including concrete, brick, stone, aggregate and block surfaces; solution for use on a masonry surface to remove contaminants and deposits, and to provide a clean surface that can be sealed; solution for use on a building surface such as wood, glass, metal, plastic, masonry, composites and, stucco to remove contaminants and deposits such as efflorescence, stains, mineral deposits, discoloration and other contaminants that impact the surface of the building surface;
DEFENSE FORCE THE GARLAND COMPANY, INC. 3800 East 91st Street Cleveland OH 44105 Cleaning solution to clean, brighten and restore a masonry substrates including concrete, brick, stone, aggregate and block surfaces; solution for use on a masonry surface to remove contaminants and deposits, and to provide a clean surface that can be sealed; solution for use on a building surface such as wood, glass, metal, plastic, masonry, composites and, stucco to remove contaminants and deposits such as efflorescence, stains, mineral deposits, discoloration and other contaminants that impact the surface of the building surface;
IMPROVED 10 Printers Services Co. Suite 112 6150 Canoga Ave. Woodland Hills CA 91367 cleaning solution to clean the press cylinders used in a photographic printing process;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer, a cover for covering an upper part of the chamber, and a light source. The cleaning solution, preferably one of ozone water, hydrogen water, or electrolytic-ionized water, may be heated for a short time and used to clean the wafer.