CLEANING PREPARATIONS COMPRISED CHEMICAL

Brand Owner (click to sort) Address Description
ALL KINDS OF DIRTY ONE KIND OF CLEAN JELMAR 5550 W. Touhy Ave. Skokie IL 60077 Cleaning preparations comprised of chemical compositions that digest solids such as fats, oils and grease, for use in sinks, drains, pipes, and grease traps;
CLR PRO COMMERCIAL DRAIN LINE & GREASE TRAP TREATMENT JELMAR 5550 W. Touhy Ave. Skokie IL 60077 Cleaning preparations comprised of chemical compositions that digest solids such as fats, oils and grease, for use in sinks, drains, pipes, and grease traps;CLEAR PRO COMMERCIAL DRAIN LINE AND GREASE TRAP TREATMENT;PRO COMMERCIAL DRAIN LINE & GREASE TRAP TREATMENT;
CLR PRO SEPTIC TREATMENT JELMAR 5550 W. Touhy Ave. Skokie IL 60077 Cleaning preparations comprised of chemical compositions for removing deposit buildups from septic retaining tanks;CLEAR PRO SEPTIC TREATMENT;PRO SEPTIC TREATMENT;
CLR SEPTIC SYSTEM TREATMENT JELMAR 5550 W. Touhy Ave. Skokie IL 60077 CLEANING PREPARATIONS COMPRISED OF CHEMICAL COMPOSITIONS FOR REMOVING DEPOSIT BUILDUPS FROM SEPTIC RETAINING TANKS;SEPTIC SYSTEM TREATMENT;
CLR SEPTIC SYSTEM TREATMENT & DRAIN CARE JELMAR 5550 W. Touhy Ave. Skokie IL 60077 Cleaning preparations comprised of chemical compositions for removing deposit buildups from septic retaining tanks;CLR SEPTIC SYSTEM TREATMENT AND DRAIN CARE;SEPTIC SYSTEM TREATMENT & DRAIN CARE;
CLR SEPTIC TREATMENT AND DRAIN MAINTENANCE JELMAR 5550 W. Touhy Ave. Skokie IL 60077 Cleaning preparations comprised of chemical compositions for removing deposit buildups from septic retaining tanks;SEPTIC TREATMENT AND DRAIN MAINTENANCE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.