CHEMICAL PRECURSORS USED IN

Brand Owner (click to sort) Address Description
DERMOSACCHARIDES LS LABORATORIES SEROBIOLOGIQUES, INC. 161 CHAMBERS BROOK ROAD SOMERVILLE NJ 08876 CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
ELESERYL COGNIS IP MANAGEMENT GMBH Rheinpromenade 1 Monheim 40789 Germany CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
MELHYDRAN COGNIS IP MANAGEMENT GMBH Rheinpromenade 1 Monheim 40789 Germany CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
SPHINGOCERYL COGNIS IP MANAGEMENT GMBH Rheinpromenade 1 Monheim 40789 Germany CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
TECHNOBION COGNIS IP MANAGEMENT GMBH Rheinpromenade 1 Monheim 40789 Germany CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
VITADERMINE LABORATOIRES SEROBIOLOGIQUES, INC. 161 CHAMBERS BROOK ROAD SOMERVILLE NJ 08876 CHEMICAL PRECURSORS USED IN THE MANUFACTURE OF COSMETICS AND PHARMACEUTICALS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Chemical vapor deposition processes utilize higher order silanes and germanium precursors as chemical precursors. The processes have high deposition rates yet produce more uniform films, both compositionally and in thickness, than films prepared using conventional chemical precursors. In preferred embodiments, trisilane is employed to deposit SiGe-containing films that are useful in the semiconductor industry in various applications such as transistor gate electrodes.