ANY WIDE

Brand Owner (click to sort) Address Description
ANYWIDE Qiu,Xiaoshi No.44, Wangzhuang, Lizhuang Vil., Liang Wenzhou 455104 China ANY WIDE;Bath brushes; Ceramic soot blocker for use on candle jars; Containers for household or kitchen use; Drinking cups for babies and children; Electric toothbrushes; Grooming tools for pets, namely, combs and brushes; Hand wash basins in the nature of bowls; Insect collecting cages; Insect habitats; Japanese style earthenware mortars for kitchen use (suribachi); Laundry baskets for household purposes; Lemon squeezers; Make-up brushes; Mosaic art tiles made of glass and ceramic; Non-electric coffee drippers for brewing coffee; Shaker bottles sold empty; Soap containers; Spice racks; Step trash cans; Wash basins in the nature of bowls; Washing cloths; Water apparatus for cleaning teeth and gums for home use; Whisks, non-electric, for household purposes; Window dusters; Wine openers;
ANYWIDE Qiu,Xiaoshi No.44, Wangzhuang, Lizhuang Vil., Liang Wenzhou 455104 China ANY WIDE;Cat scratching pads; Chairs; Chests for toys; Clips of plastic for sealing bags; Clips, not of metal, for cables and pipes; Closet accessories, namely, shoe racks; Clothes hangers; Desks; Display racks; Fitted furniture covers; Furniture; Hat hooks, not of metal; Infant beds; Non-metal clips for fastening pairs of socks for laundering; Non-metal clothes hooks; Non-metal pipe and cable clips; Non-metal pipe clips; Non-metal storage boxes for general use; Pet furniture; Pillows; Plastic storage drums; Plastic storage tanks; Plastic shipping and storage boxes; Storage racks; Towel racks;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A reticle manufacturing method comprises a step of retreating side surfaces of a lift-off pattern to reduce an area of a wide pattern portion, a step of forming a wide convex pattern and a narrow convex pattern by etching a glass substrate (transparent substrate) while using a second mask pattern as a mask, a step of reducing an area of a first wide mask portion, a step of reducing at least an area of a second wide mask portion smaller than an area of the first wide mask portion, and a step of reducing an area of a wide light shielding portion by etching the wide light shielding portion while using the first wide mask portion as a mask.